Progress in the Copper-Based Diamond Composites for Thermal Conductivity Applications
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2023-06-01 |
| Journal | Crystals |
| Authors | Kang Chen, Xuesong Leng, Rui Zhao, Yiyao Kang, Hongsheng Chen |
| Institutions | Harbin Institute of Technology |
| Citations | 27 |
| Analysis | Full AI Review Included |
Technical Documentation & Analysis: Copper-Based Diamond Composites for Thermal Management
Section titled âTechnical Documentation & Analysis: Copper-Based Diamond Composites for Thermal ManagementâThis documentation analyzes the research review âProgress in the Copper-Based Diamond Composites for Thermal Conductivity Applicationsâ to highlight critical material requirements and demonstrate how 6CCVDâs advanced MPCVD diamond products and customization services provide essential solutions for replicating and advancing this research.
Executive Summary
Section titled âExecutive SummaryâCopper-based diamond composites are critical for next-generation thermal management in high-power electronics, military, and aerospace applications, requiring thermal conductivity (TC) exceeding 900 W/(m·K).
- Core Challenge: The natural non-wetting behavior between copper and diamond creates high interfacial thermal resistance (ITR), limiting composite TC.
- Solution Strategy: ITR is mitigated by forming stable carbide layers (e.g., TiC, WC, Cr7C3) at the interface, achieved through diamond surface metallization or matrix alloying (using elements like Ti, W, Cr, Zr, and B).
- Key Material Parameters: Optimal performance requires high-purity diamond particles with intrinsic TC of 1200-2500 W/(m·K), a particle size range of 100 ”m to 300 ”m, and a diamond volume fraction of 50-60 vol%.
- Achieved Performance: Recent studies utilizing optimized interface engineering and pressure infiltration techniques have successfully achieved composite thermal conductivities up to 930 W/(m·K).
- 6CCVD Value Proposition: 6CCVD provides the necessary high-purity Single Crystal Diamond (SCD) and Polycrystalline Diamond (PCD) materials, coupled with in-house metalization capabilities (Ti, W, Cu) to streamline interface modification research and accelerate the development of high-performance thermal packaging solutions.
Technical Specifications
Section titled âTechnical SpecificationsâThe following hard data points were extracted from the analysis of copper-based diamond composite research:
| Parameter | Value | Unit | Context |
|---|---|---|---|
| Intrinsic Diamond TC | 1200 to 2500 | W/(m·K) | High-quality diamond reinforcement material |
| Copper Matrix TC | 398 to 400 | W/(m·K) | Pure copper matrix |
| Target Composite TC | > 900 | W/(m·K) | Required for advanced electronic packaging |
| Highest Reported Composite TC (Zr Alloy) | 930 | W/(m·K) | Achieved via pressure infiltration |
| Highest Reported Composite TC (B Alloy) | 913 | W/(m·K) | Achieved via pneumatic infiltration |
| Recommended Diamond Volume Fraction | 50 to 60 | vol% | Optimized range for cost and density |
| Optimal Diamond Particle Size | 100 to 300 | ”m | Range used in recent high-TC studies |
| Interfacial Thermal Resistance (ITR) Example | 2.9 x 10-7 | m2·K/W | Experimentally determined value |
| Typical SPS Sintering Temperature | 800 to 970 | °C | Used for rapid consolidation |
| Carbide Layer Thickness (Example) | 5 to 20 | nm | Optimized Cr carbide layer thickness |
Key Methodologies
Section titled âKey MethodologiesâResearch progress focuses heavily on two primary strategies for enhancing wettability and several advanced consolidation techniques:
-
Interface Modification Techniques:
- Diamond Surface Metallization: Coating diamond particles with carbide-forming elements (Ti, W, Cr, Mo, B) using:
- Electroplating (EP)
- Magnetron Sputtering (MS)
- Salt Bath Coating (SBC)
- Vacuum Micro-Evaporation Plating (VMEP)
- Matrix Alloying: Introducing carbide-forming elements (Ti, W, Cr, Zr, B) into the copper matrix via:
- Gas Atomization (for powder preparation)
- Alloy Melting (for liquid phase infiltration)
- Diamond Surface Metallization: Coating diamond particles with carbide-forming elements (Ti, W, Cr, Mo, B) using:
-
Consolidation and Forming Techniques:
- Pressure Infiltration (PI): Molten copper (or alloy) is forced into a densely packed diamond preform under pressure, achieving high density and high TC (e.g., 930 W/(m·K)).
- Spark Plasma Sintering (SPS): Rapid sintering of mixed powders using pulsed current and pressure, suitable for lower temperature processing (800-970 °C).
- Vacuum Hot-Press Sintering (VHPS): Sintering powders in a vacuum environment, known for uniform heating and reduced thermal stress.
- High-Temperature and High-Pressure Sintering (HTHP): Used to achieve high densities, particularly when diamond volume fraction exceeds 70 vol%.
6CCVD Solutions & Capabilities
Section titled â6CCVD Solutions & Capabilitiesâ6CCVD is uniquely positioned to supply the high-purity diamond materials and specialized surface treatments required to advance research in copper-based diamond composites for thermal management. Our MPCVD technology ensures the highest intrinsic thermal conductivity, which is the foundational requirement for achieving composite TC > 900 W/(m·K).
| Research Requirement | 6CCVD Applicable Materials & Services | Technical Advantage for Client |
|---|---|---|
| High Intrinsic TC Diamond Reinforcement | Optical Grade SCD and High-Purity PCD: Our MPCVD diamond offers intrinsic TC values (1200-2500 W/(m·K)) necessary to maximize composite performance. We provide SCD/PCD in thicknesses from 0.1 ”m up to 500 ”m. | Ensures the highest quality starting material, directly addressing the need for maximum phonon transport efficiency. |
| Custom Dimensions for Preforms/Molds | Custom Plates and Wafers up to 125mm (PCD): We can supply large-area PCD wafers or thick SCD substrates (up to 10mm) tailored for subsequent crushing into optimal particle sizes (100-300 ”m) or for use as large-scale composite substrates. | Supports large-scale experimental setups and pilot production runs, overcoming the size limitations noted with graphite molds in HTHP/SPS methods. |
| Interface Carbide Coating Elements (Ti, W) | In-House Metalization Services (Ti, W, Cu): The paper identifies Ti and W as crucial carbide-forming elements. 6CCVD offers internal deposition of Ti and W layers, allowing researchers to acquire pre-metallized diamond substrates or particles. | Streamlines the R&D process by providing uniform, high-quality carbide precursor coatings, eliminating the need for complex in-house MS or VMEP equipment. |
| Fundamental Interface Studies | Ultra-Smooth SCD Substrates (Ra < 1nm): For detailed characterization of carbide layer formation and acoustic mismatch modeling (as discussed in Section 2.3), 6CCVD provides SCD polished to an atomic-level smoothness (Ra < 1nm). | Enables precise, high-resolution analysis of the diamond/carbide/copper interface structure, critical for optimizing ITR. |
| Need for High-Strength Composites | Boron-Doped Diamond (BDD) Options: While the paper focuses on TC, it concludes that future work must address mechanical strength. BDD materials can be explored as a matrix or reinforcement phase for enhanced mechanical properties alongside thermal performance. | Offers flexibility for researchers focusing on the dual challenge of achieving high TC and high mechanical strength for robust electronic packaging. |
Engineering Support
Section titled âEngineering Supportâ6CCVDâs in-house PhD team specializes in advanced MPCVD diamond growth and interface engineering. We offer comprehensive material consultation to assist researchers and engineers in selecting the optimal diamond type (SCD vs. PCD), doping level, and metalization scheme for high-TC electronic packaging and heat sink applications. We also manage global logistics, offering DDU (Delivered Duty Unpaid) as default and DDP (Delivered Duty Paid) options for seamless international delivery.
For custom specifications or material consultation, visit 6ccvd.com or contact our engineering team directly.
View Original Abstract
Copper-based diamond composites have been the focus of many investigations for higher thermal conductivity applications. However, the natural non-wetting behavior between diamond particles and copper matrix makes it difficult to fabricate copper-based diamond composites with high thermal conductivity. Thus, to promote wettability between copper and diamond particles, the copper/diamond interface must be modified by coating alloying elements on the diamond surface or by adding active alloying elements with carbon in the copper matrix. In this paper, we review the research progress on copper-based diamond composites, including theoretical models for calculating the thermal conductivity and the effect of process parameters on the thermal conductivity of copper-based diamond composites. The factors that affect interfacial thermal conductivity are emphatically analyzed in this review. Finally, the current problems of copper-based diamond composites and future research trends are recommended.
Tech Support
Section titled âTech SupportâOriginal Source
Section titled âOriginal SourceâReferences
Section titled âReferencesâ- 2006 - Thermal interface materials-A review of the state of the art [Crossref]
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- 2011 - Thermal properties of diamond/SiC/Al composites with high volume fractions [Crossref]
- 2012 - Thermal conductivity and microstructure of Al/diamond composites with Ti-coated diamond particles consolidated by spark plasma sintering [Crossref]
- 2012 - Effect of copper content on the thermal conductivity and thermal expansion of Al-Cu/diamond composites [Crossref]
- 2011 - Effect of coating on the microstructure and thermal conductivities of diamond-Cu composites prepared by powder metallurgy [Crossref]
- 2018 - Numerical simulation of thermal conductivity of diamond/copper composites
- 2008 - Interfacial design of Cu-based composites prepared by powder metallurgy for heat sink applications [Crossref]