Surface and subsurface microstructure properties of monocrystalline silicon cut by electroplated diamond wire saw
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2025-09-28 |
| Journal | Surface Science and Technology |
| Authors | Dong Hui, Yufei Gao, Chunfeng Yang |
| Institutions | Shandong University, Shandong Jiaotong University |
| Analysis | Full AI Review Included |
Technical Documentation & Analysis: MPCVD Diamond for High-Precision Slicing Tools
Section titled âTechnical Documentation & Analysis: MPCVD Diamond for High-Precision Slicing ToolsâExecutive Summary
Section titled âExecutive SummaryâThis analysis focuses on optimizing diamond wire sawing parameters for monocrystalline silicon (mono-Si) wafers, directly addressing critical quality metrics relevant to the photovoltaic and microelectronics industries. The findings underscore the necessity of high-performance diamond materials to minimize surface damage.
- Core Challenge: Minimizing Saw Mark Peak-Valley (PV) values and Subsurface Damage (SSD) depth, which currently range up to 5.3 ”m (PV) and 22.8 ”m (SSD) under tested conditions.
- Dominant Factor: Specimen Feed Speed ($V_f$) was identified as having the greatest impact on both PV and SSD values, followed by specimen length and wire speed.
- Material Removal Mode: Wafer surface generation is a mixed mode of brittle (resulting in pits) and ductile (resulting in grooves) material removal.
- Quality Target: Achieving low SSD (ideally < 4 ”m) requires high-performance wire saw cutting machines and superior diamond abrasive quality, a key area where 6CCVDâs materials excel.
- Optimization Strategy: To improve wafer quality, researchers must increase wire speed ($V_s$) and decrease feed speed ($V_f$) and specimen length ($L$).
- 6CCVD Value Proposition: 6CCVD supplies high-purity, custom MPCVD diamond materials (SCD and PCD) necessary to manufacture the next generation of high-speed, low-damage diamond wire tooling required to meet stringent SSD targets.
Technical Specifications
Section titled âTechnical SpecificationsâThe following hard data points were extracted from the experimental results and material descriptions, highlighting the performance achieved and the critical parameters involved in the slicing process.
| Parameter | Value | Unit | Context |
|---|---|---|---|
| Core Wire Diameter | 120 | ”m | Electroplated Diamond Wire |
| Envelope Diameter | 160 | ”m | Electroplated Diamond Wire |
| Abrasive Type | Nickel Coated Diamond | N/A | Electroplated Abrasive |
| Abrasive Size | 15-20 | ”m | Used in Wire Saw |
| Abrasive Density | 120-130 | grits/mm | Used in Wire Saw |
| Saw Mark Waviness (PV) Range | 1.468 to 5.3 | ”m | Across all tested parameters |
| Subsurface Damage (SSD) Range | 7 to 22.8 | ”m | Across all tested parameters |
| Surface Roughness (Ra) Range | 0.525 to 0.712 | ”m | Dependent on Wire Speed |
| Desired SSD Target (Industry) | < 4 | ”m | Required for high-performance wafers |
| Critical Cutting Depth | Brittle-Ductile Transition | N/A | Determines SSD formation |
Key Methodologies
Section titled âKey MethodologiesâThe experiment utilized single factor and orthogonal experimental designs to isolate the influence of three primary variables on wafer quality metrics (PV and SSD).
- Equipment: Reciprocating single diamond wire saw device (WXD170).
- Workpiece Material: Monocrystalline silicon (mono-Si) bricks/rods.
- Cooling/Lubrication: Deionized water.
- Measurement Tools: Keyence laser confocal microscope (VK-X200K) for surface topography, PV, and SSD.
- SSD Measurement Preparation: Wafer specimens were inlayed, lapped, polished, and corroded using an acidic solution (H2O:HF49%:CrO3 = 200 ml: 200 ml: 30 g) to reveal subsurface microcracks.
- Orthogonal Experimental Parameters (3 Factors, 3 Levels):
| Factor | Level 1 | Level 2 | Level 3 | Unit |
|---|---|---|---|---|
| (A) Specimen Feed Speed ($V_f$) | 0.8 | 1.0 | 1.2 | mm/min |
| (B) Diamond Wire Speed ($V_s$) | 60 | 80 | 100 | m/min |
| (C) Specimen Length ($L$) | 20 | 30 | 40 | mm |
6CCVD Solutions & Capabilities
Section titled â6CCVD Solutions & CapabilitiesâThe research highlights a clear need for advanced diamond abrasive technology to push SSD values below the current experimental minimum of 7 ”m and achieve the industry target of < 4 ”m. 6CCVDâs MPCVD diamond materials provide the necessary foundation for this next generation of high-performance slicing tools.
Applicable Materials
Section titled âApplicable MaterialsâThe performance of the diamond abrasive is paramount. 6CCVD recommends the following materials for tooling manufacturers seeking to replicate or extend this research into high-speed, low-damage slicing:
- High-Purity Polycrystalline Diamond (PCD):
- Application: Ideal for manufacturing large-area, high-strength diamond wire dies or wear parts in the wire saw system, ensuring superior dimensional stability and reduced lateral vibration (a key cause of high PV values).
- Capability Match: 6CCVD offers PCD plates/wafers up to 125mm in diameter, allowing for the creation of robust, large-scale tooling components.
- Single Crystal Diamond (SCD) Substrates:
- Application: Used for ultra-precision dies, guides, or specialized abrasive particles where maximum hardness, thermal stability, and low defect density are critical for maintaining a consistent cutting depth ($g$) and minimizing brittle fracture.
- Capability Match: SCD available in thicknesses from 0.1 ”m up to 500 ”m, with polishing quality Ra < 1nm for critical contact surfaces, ensuring minimal friction and superior wire guidance accuracy.
Customization Potential
Section titled âCustomization PotentialâThe paper notes that wire bow and lateral forces significantly influence PV and SSD. Custom tooling components require precise dimensions and specialized surface treatments.
| Research Requirement | 6CCVD Customization Capability | Benefit to Slicing Process |
|---|---|---|
| High-Precision Tooling Components | Custom SCD/PCD Substrates (up to 10mm thickness) | Enhanced rigidity and reduced wire vibration, directly lowering PV values. |
| Specialized Wire Guides/Dies | Custom dimensions and laser cutting services | Ensures tighter tolerances on wire path, minimizing lateral force fluctuations. |
| Tooling Integration | Internal Metalization Services (Au, Pt, Pd, Ti, W, Cu) | Allows for robust bonding and integration of diamond components into electroplated or resin-bonded wire saw systems. |
| Surface Quality | PCD Polishing to Ra < 5nm (Inch-size) | Reduces friction and wear on guide wheels and dies, extending tool life and maintaining high wire speed stability. |
Engineering Support
Section titled âEngineering SupportâThe transition to âlarger silicon wafer size and finer diamond wire diameterâ requires sophisticated material selection. 6CCVDâs in-house PhD team specializes in the mechanical and thermal properties of MPCVD diamond.
- Consultation Focus: We assist engineers in selecting the optimal diamond material (SCD vs. PCD) and geometry to achieve the desired brittle-ductile transition control, enabling low SSD (< 4 ”m) slicing performance at high wire speeds.
- Global Supply Chain: 6CCVD provides reliable, global shipping (DDU default, DDP available) to ensure rapid deployment of custom diamond solutions for high-volume manufacturing environments.
Call to Action: For custom specifications or material consultation, visit 6ccvd.com or contact our engineering team directly.