Multifunctional CVD diamond window for Infrared imaging
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2025-03-18 |
| Journal | MRS Advances |
| Authors | R. Guillemet, ManeâSi Laure Lee, Doriane Jussey, Elyess Traouli, Brigitte Loiseaux |
| Analysis | Full AI Review Included |
Technical Documentation & Analysis: Multifunctional CVD Diamond Windows
Section titled âTechnical Documentation & Analysis: Multifunctional CVD Diamond WindowsâExecutive Summary
Section titled âExecutive SummaryâThis research successfully demonstrates a multifunctional CVD diamond optical window leveraging metasurface technology and electrochemical activation for superior performance in harsh LWIR imaging environments.
- LWIR Performance: Achieved enhanced transmission of 80-90% across the critical 8-14 ”m Long-Wave Infrared (LWIR) band using subwavelength conical metasurfaces, representing a 20-30% gain over bare polished diamond.
- Extreme Fluidic Resistance: The surface exhibits robust superhydrophobicity (Contact Angle ~160°) and effective antirain/antimist properties, preventing image degradation in wet conditions.
- Mechanical Durability: Nanoscratch testing confirmed exceptional mechanical resistance, with full diamond structures withstanding vertical forces up to 5 mN and severe abrasion (40 frictions @ 10N) without breakage, significantly outperforming DLC-coated Germanium.
- Active Self-Cleaning: Integration of a low-doped Boron-Doped Diamond (BDD) coating enables electrochemical antifouling. Contaminants (oil/gasoline) were completely removed within minutes using a low anodic current (100 mA/cm2).
- Scalability: The fabrication methodology (nano-imprint lithography and RIE-ICP etching) is confirmed to be scalable and compatible with large-area and curved diamond surfaces.
- Core Value Proposition: CVD diamond provides a single material solution combining outstanding optical, mechanical, and electrochemical properties for low-maintenance, 24/7 operation of optronics systems.
Technical Specifications
Section titled âTechnical Specificationsâ| Parameter | Value | Unit | Context |
|---|---|---|---|
| Substrate Material | CVD Diamond | N/A | Used for 2â optical window |
| Window Diameter | 2 | inches | Demonstrated functional size |
| Substrate Thickness | 1 | mm | As-purchased material |
| Initial Roughness (Ra) | < 15 | nm | Average roughness on both faces |
| Operational Wavelength Range | 8-14 | ”m | Long-Wave Infrared (LWIR) |
| Peak Transmission (Structured) | 80-90 | % | Double-sided structured window |
| Transmission Enhancement | 20-30 | % | Increase over bare polished diamond (~68%) |
| Metasurface Periodicity | ~2 | ”m | Conical structures |
| Structure Aspect Ratio | > 1:4 | N/A | High aspect ratio microstructuration |
| Superhydrophobicity | ~160 | ° | Drop contact angle (DI or tap water) |
| BDD Coating Thickness | ~100 | nm | Applied for electrochemical antifouling |
| BDD Doping Level | ~1018 | at.cm-3 | Low doping to maintain IR transparency |
| Nanoscratch Resistance | 5 | mN | Maximum vertical force applied without structure breakage |
| Electrochemical Cleaning Current | 100 | mA/cm2 | Anodic treatment for contaminant removal |
Key Methodologies
Section titled âKey MethodologiesâThe multifunctional diamond window was manufactured using a scalable process flow combining advanced lithography, plasma etching, and surface functionalization.
- Substrate Acquisition: A 2â CVD diamond window (1 mm thick, Ra < 15 nm) was sourced as the base material.
- Pattern Definition (Nano-imprint Lithography): A lithography step, based on nano-imprint lithography (NIL), was used to define the ~2 ”m periodic conical patterns in a resist layer. NIL is noted for its scalability and compatibility with curved surfaces.
- Hard Mask Transfer: The patterns were transferred into a Ni-based metallic hard mask deposited via sputtering.
- Diamond Etching (RIE-ICP): Reactive Ion Etching - Inductively Coupled Plasma (RIE-ICP) using O2 plasma was employed to achieve high aspect ratio microstructuration (> 1:4) in the diamond substrate.
- Antifouling Layer Deposition: A thin (~100 nm) layer of low-doped Boron-Doped Diamond (BDD) was deposited via CVD to enable electrochemical self-cleaning properties.
- Superhydrophobic Functionalization: An additional chemical functionalization step was carried out using C4F8 plasma to deposit a few nm thick Polytetrafluoroethylene (PTFE) layer, resulting in the ~160° contact angle.
- Electrochemical Activation: Anodic treatment using a continuous current of 100 mA/cm2 was applied to the BDD surface to generate oxidant radicals (OH*) for self-cleaning of oil/gasoline contaminants.
6CCVD Solutions & Capabilities
Section titled â6CCVD Solutions & CapabilitiesâThe successful replication and extension of this multifunctional diamond technology rely heavily on high-quality, large-area CVD diamond substrates and specialized processing capabilities. 6CCVD is uniquely positioned to supply the foundational materials and engineering support required for next-generation LWIR optics.
| Research Requirement | 6CCVD Solution & Capability | Technical Advantage for Replication/Extension |
|---|---|---|
| High-Quality Substrate | Optical Grade Polycrystalline Diamond (PCD) | We provide high-purity MPCVD PCD plates up to 125 mm in diameter, exceeding the 2â size used in the study, enabling larger format LWIR windows. |
| Specific Material Doping | Custom Boron-Doped Diamond (BDD) | We specialize in BDD growth, offering precise control over doping levels (e.g., 1018 at.cm-3) and thickness (0.1 ”m - 500 ”m) necessary for optimal electrochemical antifouling without sacrificing IR transparency. |
| Substrate Dimensions | Custom Thicknesses and Substrates | We supply SCD and PCD wafers in the required 1 mm thickness, and offer robust substrates up to 10 mm thick for extreme mechanical applications or high-pressure environments. |
| Surface Preparation | Precision Polishing Services | Achieving the necessary low roughness for subsequent nano-imprint lithography is critical. We guarantee ultra-smooth surfaces: Ra < 1 nm for SCD and Ra < 5 nm for inch-size PCD. |
| Hard Mask Integration | In-House Metalization Services | The RIE-ICP etching process requires a robust hard mask (e.g., Ni-based). 6CCVD offers internal deposition of key metals (Ti, W, Pt, Au, Cu) to facilitate complex microstructuring processes. |
| Engineering Expertise | PhD-Level Material Consultation | 6CCVDâs in-house PhD team can assist engineers and scientists with material selection, doping optimization, and interface engineering for similar LWIR metasurface and antifouling projects. |
For custom specifications or material consultation, visit 6ccvd.com or contact our engineering team directly.
View Original Abstract
Abstract Diamond is well known for its outstanding thermal, electrical, and mechanical properties, but is also of great interest for optical and imaging applications. Imaging systems offer increasing performances, with high functionalities and technicity, but are often exposed to harsh or visually degraded environments. In this paper, we exploit some of the multiple physical properties of chemical vapor deposition (CVD) diamond and demonstrate the feasibility of diamond-based metasurface multifunctional windows for infrared spectral range, throughout different configurations. The resulting 2Ⳡfull diamond optical window provides imaging systems with several functionalities, including antireflective optical properties with an enhanced transmission up to 80-90% in the 8-14 ”m spectral range, high mechanical resistance, superhydrophobicity, antirain, and antimist behaviors. Moreover, the electrochemical activation of a boron-doped diamond-based window leads to self-cleaning properties, thus paving the way for the imaging system to low maintenance operations and 24/7 operation. Graphical abstract