Influence of bath temperature and deposition time on hardness and magnetisation of electrodeposited Nickel Manganese Tungsten thin films
At a Glance
Section titled âAt a Glanceâ| Metadata | Details |
|---|---|
| Publication Date | 2023-04-01 |
| Journal | Journal of Ovonic Research |
| Authors | P. Kirthika, N. Thangaraj, Periyasamy Anitha |
| Citations | 1 |
| Analysis | Full AI Review Included |
Technical Documentation & Analysis: MPCVD Diamond for Advanced Electrodeposition Applications
Section titled âTechnical Documentation & Analysis: MPCVD Diamond for Advanced Electrodeposition ApplicationsâExecutive Summary
Section titled âExecutive SummaryâThis research investigates the structural, magnetic, and mechanical properties of electrodeposited Nickel Manganese Tungsten (Ni-Mn-W) thin films, identifying them as promising candidates for Micro Electro Mechanical Systems (MEMS) components, high-strength alloys, and magnetic refrigeration technology due to their enhanced magnetization and low hysteresis.
| Focus Area | Research Achievement | 6CCVD Value Proposition |
|---|---|---|
| Application | High-strength alloys for MEMS (gears, actuators, springs) and magnetic refrigeration. | Diamond (SCD/PCD) offers superior hardness, stiffness, and thermal management for next-generation MEMS. |
| Material Properties | Nanocrystalline structure (23-30 nm grain size) yielding high hardness and tailored magnetic response. | 6CCVD provides ultra-hard SCD and PCD substrates, ideal for depositing functional thin films with controlled nucleation and morphology. |
| Methodology | Electrodeposition process controlled by bath temperature (35-55 °C) and time (15-45 min) on a Copper substrate. | 6CCVD offers Boron-Doped Diamond (BDD) electrodes and substrates, providing chemically inert, highly conductive, and dimensionally stable platforms for advanced electrochemical processes. |
| Key Finding | Optimal mechanical and magnetic properties achieved at a bath temperature of 45 °C, resulting in enhanced magnetization and reduced hysteresis compared to bulk materials. | Our custom metalization services (Au, Pt, Ti) ensure robust electrical contacts and integration necessary for VSM and electrochemical testing of thin films deposited on diamond. |
Technical Specifications
Section titled âTechnical SpecificationsâThe following hard data points were extracted from the study regarding the synthesis and resulting properties of the Ni-Mn-W thin films:
| Parameter | Value | Unit | Context |
|---|---|---|---|
| Deposition Current Density | 3 | mA/cm2 | Constant current mode |
| Optimal Bath Temperature | 45 | °C | Yields lowest microstrain, lowest dislocation density, and optimal hardness/magnetization. |
| Temperature Range Studied | 35, 45, 55 | °C | Variation of bath temperature |
| Deposition Time Range | 15, 30, 45 | minutes | Optimized deposition duration |
| Average Crystallite Size | 23 to 30 | nm | Determined by XRD (Debye-Scherrer relation) |
| Maximum Hardness | Increases up to 45 °C | Vickers Hardness Number | Measured under various loads (25g to 300g) |
| Coercivity Range (Hc) | 72.620 to 232.21 | Oe | Decreases with increasing grain size/particle diameter |
| Magnetization Range (Ms) | 1.6171 to 2.5611 | x 10-3 emu | Varies significantly with temperature and time |
| Electrolyte pH | 4 to 5 | N/A | Maintained using concentrated H2SO4 |
Key Methodologies
Section titled âKey MethodologiesâThe Ni-Mn-W thin films were prepared via cathodic electrodeposition. Key process parameters and analytical techniques are summarized below:
A. Electrodeposition Recipe Parameters
Section titled âA. Electrodeposition Recipe Parametersâ- Substrate (Cathode): Copper plate (2 x 7 cm total size; 2 x 5 cm exposed area).
- Anode: Nickel plate.
- Electrolyte Composition:
- Nickel source: 0.1 M NiCl2¡6H2O
- Manganese source: 0.1 M MnCl2¡H2O
- Tungsten source: 0.05 M Na2WO4
- pH Control: Maintained between 4 and 5 using concentrated H2SO4 acid.
- Deposition Mode: Constant current density of 3 mA/cm2.
- Variables Studied: Bath temperature (35, 45, 55 °C) and deposition time (15, 30, 45 minutes).
B. Characterization Techniques
Section titled âB. Characterization Techniquesâ- Structural Analysis: X-ray Diffraction (XRD) for crystal structure, 2θ values, and crystallite size (Debye-Scherrer method).
- Morphological Analysis: Scanning Electron Microscopy (SEM) for surface morphology and grain size verification.
- Compositional Analysis: Energy Dispersive X-ray Spectroscopy (EDAX) for elemental confirmation and stoichiometry (optimal at 45 °C).
- Magnetic Properties: Vibrating Sample Magnetometer (VSM) for coercivity and saturation magnetization measurements.
- Mechanical Properties: Vickers Hardness tester (diamond indenter method) for hardness measurements under various loads (25g to 300g).
6CCVD Solutions & Capabilities
Section titled â6CCVD Solutions & CapabilitiesâThe research demonstrates the potential of Ni-Mn-W films for high-performance magnetic and mechanical components, particularly in MEMS and energy storage (supercapacitors). 6CCVDâs MPCVD diamond materials offer critical advantages for replicating, optimizing, and extending this research into commercial viability.
Applicable Materials for Research Extension
Section titled âApplicable Materials for Research Extensionâ| Research Requirement | 6CCVD Material Solution | Technical Advantage |
|---|---|---|
| High-Performance MEMS Substrates | Optical Grade SCD (Single Crystal Diamond) | SCD provides the highest stiffness, lowest thermal expansion, and exceptional thermal conductivity (up to 2200 W/mK), far surpassing Cu or standard silicon for high-power or high-frequency MEMS actuators and sensors. |
| Advanced Electrochemical Electrodes | Heavy Boron-Doped Diamond (BDD) | BDD is chemically inert and highly conductive, making it an ideal, stable platform for electrodeposition studies. It eliminates substrate corrosion and interference seen with traditional metal substrates (like Cu). |
| Hard, Protective Coatings | Polycrystalline Diamond (PCD) Wafers | PCD offers extreme hardness (Vickers Hardness > 80 GPa) and can serve as a robust, large-area substrate (up to 125mm) for testing the mechanical durability of deposited Ni-Mn-W films in harsh environments. |
| Thermal Management | High-Purity SCD/PCD Substrates | Diamondâs superior thermal properties are essential for managing heat generated in high-density recording media or magnetic refrigeration systems utilizing the magnetocaloric effect (MCE). |
Customization Potential for Electrodeposition Research
Section titled âCustomization Potential for Electrodeposition ResearchâThe successful replication and scaling of this research require precise control over substrate geometry, surface quality, and electrical contactsâall core competencies of 6CCVD.
- Custom Dimensions and Substrates: The paper used 2 x 5 cm exposed Cu substrates. 6CCVD can provide custom-sized diamond plates and wafers, including PCD up to 125mm diameter and SCD up to 10mm thick, precisely cut to required dimensions for standardized electrochemical cells.
- Ultra-Low Roughness: The study relies on smooth surfaces for thin film deposition. 6CCVD guarantees polishing down to Ra < 1nm for SCD and Ra < 5nm for inch-size PCD, ensuring optimal nucleation and minimizing micro-cracks caused by internal stress (as observed in the paper).
- Integrated Metalization: For VSM and electrochemical testing, robust electrical contacts are crucial. 6CCVD offers in-house custom metalization (e.g., Ti/Pt/Au, W, Cu) tailored to the specific adhesion and conductivity requirements of the deposited Ni-Mn-W films. This eliminates the need for external processing steps.
- BDD Electrode Fabrication: For researchers extending this work to supercapacitor applications, 6CCVD can supply BDD electrodes with controlled doping levels, optimized for high power density and long cycle life, far exceeding the performance of carbon or transition metal oxide electrodes mentioned in the introduction.
Engineering Support
Section titled âEngineering Supportâ6CCVDâs in-house PhD team specializes in the integration of functional materials onto diamond platforms. We can assist researchers in:
- Material Selection: Determining the optimal diamond grade (SCD, PCD, or BDD) and orientation for specific magnetic or mechanical MEMS component projects.
- Interface Engineering: Consulting on surface preparation and metalization schemes to ensure maximum adhesion and minimal interfacial resistance between the electrodeposited Ni-Mn-W film and the diamond substrate.
- Global Logistics: Ensuring reliable, prompt global delivery of custom diamond solutions (DDU default, DDP available).
For custom specifications or material consultation, visit 6ccvd.com or contact our engineering team directly.
View Original Abstract
The Nickel Manganese Tungsten (Ni-Mn-W) thin films were prepared at different temperature and time of deposition on copper substrate. The crystal structure and morphology of deposits were analysed by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The XRD revealed that the structure of Ni-Mn-W thin films with have an average grain size of about 28 nm for 45o C. The elemental analysis of Ni-Mn-W thin films were obtained by energy dispersive X-ray spectroscopy (EDAX). The magnetic properties of electrodeposited Ni-Mn-W thin films were obtained by vibrating sample magnetometer (VSM). The magnetic parameters of Ni-Mn-W films such as coercivity and saturation magnetization were decreased with increasing of grain size. The hardness of the films was studies by Vicker Hardness tester through diamond intender method.