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Templated Synthesis of Diamond Nanopillar Arrays Using Porous Anodic Aluminium Oxide (AAO) Membranes

MetadataDetails
Publication Date2023-02-27
JournalNanomaterials
AuthorsChenghao Zhang, Zhichao Liu, Chun Li, Jian Cao, Josephus G. Buijnsters
InstitutionsHarbin Institute of Technology, Delft University of Technology
Citations9
AnalysisFull AI Review Included

Technical Documentation & Analysis: Templated Synthesis of Diamond Nanopillar Arrays

Section titled “Technical Documentation & Analysis: Templated Synthesis of Diamond Nanopillar Arrays”

This document analyzes the research on the template-assisted synthesis of ordered diamond nanopillar arrays, highlighting the technical achievements and connecting them directly to 6CCVD’s advanced MPCVD diamond capabilities for replication and scale-up.

  • Novel Synthesis Method: A low-cost, bottom-up Hot-Filament Chemical Vapor Deposition (HFCVD) method was successfully demonstrated for growing highly ordered Nanocrystalline Diamond (NCD) nanopillar arrays.
  • Template and Substrate: The process utilized sacrificial ultra-thin Anodic Aluminum Oxide (AAO) membranes transferred onto the ultra-smooth nucleation side (Sa ~0.8 nm) of pre-grown Boron-Doped Diamond (BDD) sheets.
  • Controlled Geometry: Two distinct, vertically aligned pillar geometries were achieved: submicron pillars (~325 nm diameter) and nanoscale pillars (~85 nm diameter), both exhibiting an aspect ratio of approximately 2.5.
  • Stress Management: Significant tensile residual stress (up to 3.2 GPa) was observed in the as-grown, AAO-confined pillars due to the Coefficient of Thermal Expansion (CTE) mismatch between the AAO and NCD, which was fully released upon template removal.
  • High-Value Applications: The resulting ordered diamond nanostructures are highly relevant for next-generation applications in electrochemical sensing, skeletal tissue engineering, and advanced optics (photonic bandgap crystals).
  • 6CCVD Value Proposition: 6CCVD provides the necessary large-area BDD substrates, custom thickness control (0.1 ”m to 500 ”m), and post-processing services (polishing, metalization) required to scale this template-assisted fabrication technique to commercial wafer sizes.

The following hard data points were extracted from the research paper detailing the synthesis and resulting material properties.

ParameterValueUnitContext
Substrate MaterialPolycrystalline Boron-Doped Diamond (BDD)Film Thickness4 ”m
CVD MethodHot-Filament CVD (HFCVD)N/ATemplate-assisted growth
Substrate Temperature~725°CDuring HFCVD growth cycle
Gas Flow (CH4:H2)6:300SCCMReactive gas mixture ratio
Gas Pressure10mbarHFCVD chamber conditions
Large Pillar Diameter (Nominal)~325nmDerived from AAO template (~300 nm pore)
Small Pillar Diameter (Nominal)~85nmDerived from AAO template (~70 nm pore)
Large Pillar Height~650nmAspect ratio ~2.5
Small Pillar Height~200nmAspect ratio ~2.5
Residual Tensile Stress (Confined)3.2 ± 0.1GPaCalculated from Raman shift (1324.5 cm-1)
Flat NCD Diamond Peak Position1333.5 ± 0.3cm-1Stress-free reference
Substrate Surface Roughness (Sa)~0.8nmNucleation side of BDD sheet

The template-assisted bottom-up synthesis involved three critical stages: substrate preparation and template transfer, HFCVD growth, and sacrificial template removal.

  1. Substrate Preparation:
    • 4 ”m thick Polycrystalline Boron-Doped Diamond (BDD) films were grown on silicon wafers.
    • The Si substrate was completely removed by etching in boiling 10 M KOH aqueous solution for 3 h, releasing the free-standing BDD sheet.
    • The smooth nucleation side (Sa ~0.8 nm) of the BDD sheet was used as the target substrate for template adhesion.
  2. AAO Template Transfer:
    • Ultra-thin AAO membranes (1.6 ”m or 0.2 ”m thickness, corresponding to ~300 nm or ~70 nm pores) were transferred onto the BDD nucleation side in an acetone liquid environment.
  3. HFCVD Growth:
    • The BDD/AAO stack was loaded into an HFCVD chamber.
    • Growth parameters were fixed: Substrate temperature ~725 °C, gas pressure 10 mbar, and gas flow ratio CH4:H2 at 6:300 SCCM.
    • Growth time was varied (0.5 h or 3 h) to control pillar height, resulting in vertically aligned Nanocrystalline Diamond (NCD) pillars confined within the AAO pores.
  4. Template Removal:
    • The AAO template was chemically removed by immersion in concentrated H3PO4 acid at 200 °C for 2 h.
    • This step released the ordered diamond nanopillar arrays and simultaneously relieved the significant residual tensile stress built up during the cooling phase of the CVD process.

The successful replication and commercial scaling of this templated synthesis technique require high-quality, customizable diamond materials and advanced post-processing capabilities—all core competencies of 6CCVD.

The foundation of this research is the use of a highly conductive, smooth diamond substrate. 6CCVD provides the ideal starting material:

  • Heavy Boron-Doped Polycrystalline Diamond (BDD-PCD): The paper utilized BDD films for their conductivity and smooth nucleation side. 6CCVD specializes in high-quality BDD-PCD, offering precise control over boron concentration (tunable electrical conductivity) essential for electrochemical sensing applications (as cited in the paper).
  • Nanocrystalline Diamond (NCD): The resulting nanopillars are NCD. 6CCVD’s MPCVD systems are optimized to control the methane concentration and growth conditions necessary to tune the NCD grain size, which is critical for optimizing the performance of photonic and electrochemical structures.

The research used small, 10 × 10 mm2 samples. 6CCVD enables the transition to industrial scale and advanced device integration.

Research Requirement6CCVD CapabilityValue Proposition
Substrate SizePlates/wafers up to 125 mm (PCD/BDD)Enables large-area pattern transfer (AAO-on-diamond) for commercial production and wafer-scale integration.
Film ThicknessSCD/PCD films from 0.1 ”m to 500 ”mProvides flexibility for optimizing the initial BDD substrate thickness, crucial for mechanical stability during the lift-off and etching steps.
Surface QualityPolishing services achieving Ra < 5 nm (PCD)Guarantees the ultra-smooth nucleation surface (Sa ~0.8 nm used in the paper) required for reliable, uniform AAO template adhesion via van der Waals forces.
Device IntegrationCustom Metalization (Au, Pt, Pd, Ti, W, Cu)Essential for fabricating functional Microelectrode Arrays (MEAs) and electrochemical sensors, allowing direct electrical contact to the conductive BDD pillars.
Geometry ControlLaser Cutting and shaping servicesAllows precise cutting of the final nanopillar arrays into custom shapes required for specific biomedical or optical device footprints.

The successful synthesis of these nanostructures relies heavily on controlling the CVD environment to manage residual stress and material quality.

  • Stress Management Expertise: The paper highlights significant residual stress (3.2 GPa) due to CTE mismatch. 6CCVD’s in-house PhD team can assist researchers in optimizing CVD parameters (temperature ramps, gas mixtures) to minimize intrinsic stress and maximize the structural integrity of the resulting high-aspect-ratio diamond nanostructures.
  • Application Optimization: 6CCVD provides consultation on material selection (e.g., specific boron doping levels, NCD vs. Ultrananocrystalline Diamond) to maximize efficiency for similar projects in electrochemical sensing, quantum sensing, and biomedical engineering.

For custom specifications or material consultation, visit 6ccvd.com or contact our engineering team directly.

View Original Abstract

Diamond nanostructures are mostly produced from bulk diamond (single- or polycrystalline) by using time-consuming and/or costly subtractive manufacturing methods. In this study, we report the bottom-up synthesis of ordered diamond nanopillar arrays by using porous anodic aluminium oxide (AAO). Commercial ultrathin AAO membranes were adopted as the growth template in a straightforward, three-step fabrication process involving chemical vapor deposition (CVD) and the transfer and removal of the alumina foils. Two types of AAO membranes with distinct nominal pore size were employed and transferred onto the nucleation side of CVD diamond sheets. Subsequently, diamond nanopillars were grown directly on these sheets. After removal of the AAO template by chemical etching, ordered arrays of submicron and nanoscale diamond pillars with ~325 nm and ~85 nm diameters were successfully released.

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