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6CCVD Research

Ultratough CVD single crystal diamond and three dimensional growth thereof

At a Glance

Section titled “At a Glance”
MetadataDetails
Publication Date2023-01-23
JournalOSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information)
AuthorsRussell J. Hemley, Ho‐kwang Mao, Chih‐shiue Yan

Abstract

Section titled “Abstract”

The invention relates to a single-crystal diamond grown by microwave plasma chemical vapor deposition that has a toughness of at least about 30 MPa m.sup.1/2. The invention also relates to a method of producing a single-crystal diamond with a toughness of at least about 30 MPa m.sup.1/2. The invention further relates to a process for producing a single crystal CVD diamond in three dimensions on a single crystal diamond substrate.

Tech Support

Section titled “Tech Support”

Original Source

Section titled “Original Source”

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