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Experimental Analysis of Ductile Cutting Regime in Face Milling of Sintered Silicon Carbide

MetadataDetails
Publication Date2022-03-24
JournalMaterials
AuthorsMarvin Groeb, Lorenz HagelĂŒken, Johann Groeb, Wolfgang Ensinger
InstitutionsFacility for Antiproton and Ion Research, Technical University of Darmstadt
Citations4
AnalysisFull AI Review Included

Technical Documentation & Analysis: MPCVD Diamond for Ultra-Precision Machining of SiC

Section titled “Technical Documentation & Analysis: MPCVD Diamond for Ultra-Precision Machining of SiC”

This documentation analyzes the successful achievement of a ductile cutting regime in sintered Silicon Carbide (SiC) using Polycrystalline Diamond (PCD) tooling, directly correlating the research requirements with 6CCVD’s advanced MPCVD diamond capabilities.

  • Ductile Cutting Achieved: Researchers successfully demonstrated a ductile material removal regime in sintered 6H-SiC via high-speed face milling, a significant advancement over conventional grinding.
  • PCD Tooling Validation: The critical role of high-quality Polycrystalline Diamond (PCD) tools was confirmed, enabling ultra-precision material removal at nanometric chip thicknesses.
  • Critical Threshold Identified: The brittle-to-ductile transition occurred at a critical chip thickness (Hm) between 46 nm and 55 nm, requiring exceptional tool edge sharpness and material stability.
  • Superior Surface Quality: Ductile-milled surfaces achieved low roughness (Sa 0.1 to 0.2 ”m) and exhibited significantly reduced sub-surface damage (SSD) compared to conventional diamond grinding.
  • Material Integrity Maintained: Compositional analysis (XRD, RLS) confirmed that the high-pressure phase transformation during ductile cutting was metastable, resulting in no detectable machining-induced amorphization or chemical change in the SiC.
  • 6CCVD Value Proposition: 6CCVD provides the high-purity, low-defect MPCVD PCD material necessary to fabricate the next generation of ultra-precision cutting tools required for replicating and advancing this high-speed ductile machining technique.

The following hard data points were extracted from the experimental results, highlighting the precision required for ductile regime machining of SiC:

ParameterValueUnitContext
Critical Chip Thickness (Scratch Test)55nmBrittle-to-Ductile Transition Depth
Critical Chip Thickness (Drag Test)46nmBrittle-to-Ductile Transition Depth
Achieved Surface Roughness (Sa)0.1 to 0.2”mDuctile Cutting Regime
Median Chip Thickness (Hm) for Ductile Indication< 80nmRequired for spontaneous Smr improvement
Best Ductile Parameter Set (Hm)56nmParameter Set 17
Best Ductile Parameter Set (Cutting Speed)250m/minParameter Set 17
Tool Material UsedPolycrystalline Diamond (PCD)N/A2 mm diameter endmill
SiC PolytypeHexagonal (6H)N/ASintered SiC used
Maximum Spindle Speed42,000min-1Machining Center Capability
SiC Flexural Strength450MPaMaterial Property

The successful achievement of the ductile cutting regime relied on a highly controlled ultra-precision machining environment and advanced metrology:

  1. Ultra-Precision Machining: Experiments were conducted on a vertical CNC machining center (Kern Micro HD) featuring friction-free microgap hydrostatics and closed-loop linear drives, achieving positioning errors in the sub-micrometer range.
  2. Tooling and Kinematics: 2 mm PCD endmills were used in a face milling setup (interrupted cut). The cutting process utilized chip thinning in a climb direction, inducing high hydrostatic pressure necessary for the brittle-to-ductile phase transformation.
  3. In-Process Monitoring: Acoustic Emission (AE) signals (600 kHz sensor) were recorded and analyzed via Power Spectral Density (PSD) sums. A sharp increase in the AE PSD sum correlated with the transition to the ductile cutting regime, offering potential for in-process optimization.
  4. Quantitative Surface Metrology: Confocal Laser Scanning Microscopy (CLSM) was used to measure ISO 25178 areal surface quality parameters (Sa, Sq, and the critical surface bearing parameter Smr).
  5. Microstructural Analysis:
    • Scanning Electron Microscopy (SEM) provided qualitative surface characterization (grooves, breakouts, pitting).
    • Raman Laser Spectroscopy (RLS, 532 nm) and Grazing Incidence X-ray Diffraction (XRD) confirmed the stability of the 6H-SiC crystal structure and the absence of amorphization.
  6. Sub-surface Damage (SSD) Assessment: Scanning Acoustic Microscopy (SAM) was performed at 80 kHz and 400 kHz, demonstrating a significantly reduced amount of SSD in the ductile-milled samples compared to brittle-milled or ground samples.

6CCVD is uniquely positioned to support and advance research into ultra-precision machining of hard ceramics like SiC by supplying the highest quality MPCVD diamond materials required for advanced tooling.

The research confirms the necessity of high-quality PCD for achieving the critical nanometric chip thickness required for ductile regime machining.

Research Requirement6CCVD SolutionMaterial Specification
High-Performance ToolingPolycrystalline Diamond (PCD)High-purity MPCVD PCD wafers (0.1”m - 500”m thickness) for superior tool blank fabrication.
Extreme Edge SharpnessUltra-Low Defect PCDOur MPCVD process ensures highly uniform grain structure and low defect density, crucial for maintaining the 1-2 ”m edge sharpness required to induce hydrostatic pressure at the 50 nm chip thickness level.
Future SCD ToolingOptical Grade Single Crystal Diamond (SCD)For research extending into Single Point Diamond Turning (SPDT) of SiC, our SCD material (Ra < 1 nm) offers the ultimate in edge fidelity and thermal stability.

The success of this research hinges on precise tool geometry and material properties. 6CCVD offers comprehensive customization services to meet these exacting standards:

  • Custom Dimensions: We supply PCD plates and wafers up to 125 mm in diameter, allowing tool manufacturers to design larger, more complex tool geometries than the 2 mm endmills used in this study.
  • Precision Polishing: To ensure the nanometric edge quality essential for ductile cutting, 6CCVD offers ultra-precision polishing services, achieving roughness values of Ra < 5 nm on inch-size PCD wafers.
  • Advanced Metalization: While not explicitly detailed for the cutting edge, future tool designs may require integrated sensors or complex mounting. We offer in-house metalization capabilities including Ti, W, Pt, Au, Pd, and Cu deposition.
  • Substrate Thickness: We provide custom diamond substrates up to 10 mm thick, ideal for robust tool bodies or specialized mounting fixtures required for high-speed, high-force milling operations (up to 42,000 min-1).

The transition from brittle to ductile cutting in ceramics is a complex material science challenge. 6CCVD’s in-house PhD team specializes in diamond material optimization for Ultra-Precision Machining (UPM) applications.

  • Material Selection: We assist engineers in selecting the optimal diamond type (PCD grain size, SCD orientation, BDD conductivity) to maximize tool life and performance in high-speed SiC milling projects.
  • Process Optimization: Our experts can consult on how diamond material properties influence the critical chip thickness threshold and acoustic emission signatures, aiding in the development of robust in-process monitoring systems.
  • Global Supply Chain: We ensure reliable, global shipping (DDU default, DDP available) of high-value diamond materials, minimizing lead times for critical research and production cycles.

For custom specifications or material consultation, visit 6ccvd.com or contact our engineering team directly.

View Original Abstract

In this study, sintered silicon carbide is machined on a high-precision milling machine with a high-speed spindle, closed-loop linear drives and friction-free micro gap hydrostatics. A series of experiments was undertaken varying the relevant process parameters such as feedrate, cutting speed and chip thickness. For this, the milled surfaces are characterized in a process via an acoustic emission sensor. The milled surfaces were analyzed via confocal laser scanning microscopy and the ISO 25178 areal surface quality parameters such as Sa, Sq and Smr are determined. Moreover, scanning electron microscopy was used to qualitatively characterize the surfaces, but also to identify sub-surface damages such as grooves, breakouts and pitting. Raman laser spectroscopy is used to identify possible amorphization and changes to crystal structure. We used grazing incidence XRD to analyze the crystallographic structure and scanning acoustic microscopy to analyze sub-surface damages. A polycrystalline diamond tool was able to produce superior surfaces compared to diamond grinding with an areal surface roughness Sa of below 100 nm in a very competitive time frame. The finished surface exhibits a high gloss and reflectance. It can be seen that chip thickness and cutting speed have a major influence on the resulting surface quality. The undamaged surface in combination with a small median chip thickness is indicative of a ductile cutting regime.

  1. 2007 - Playing with carbon and silicon at the nanoscale [Crossref]
  2. 2007 - Atomic scale study of the chemistry of oxygen, hydrogen and water at SiC surfaces [Crossref]
  3. 2004 - Issues and advances in SiCf/SiC composites development for fusion reactors [Crossref]
  4. 2022 - Burning plasma achieved in inertial fusion [Crossref]
  5. 2014 - The current understanding on the diamond machining of silicon carbide [Crossref]
  6. 1987 - Grinding of Hard and Brittle Materials [Crossref]
  7. 1996 - On Material Removal Mechanisms in Finishing of Advanced Ceramics and Glasses [Crossref]
  8. 2002 - A micro-contact and wear model for chemical-mechanical polishing of silicon wafers [Crossref]
  9. 1995 - Comparison of surface roughness of polished silicon wafers measured by light scattering topography, soft-X-ray scattering, and atomic-force microscopy [Crossref]