The Interface and Fabrication Process of Diamond/Cu Composites with Nanocoated Diamond for Heat Sink Applications
At a Glance
Section titled āAt a Glanceā| Metadata | Details |
|---|---|
| Publication Date | 2021-01-22 |
| Journal | Metals |
| Authors | Yaqiang Li, Hongyu Zhou, Chunjing Wu, Zheng Yin, Chang Liu |
| Institutions | University of Science and Technology Beijing, Baise University |
| Citations | 18 |
| Analysis | Full AI Review Included |
Technical Documentation & Analysis: High-Performance Diamond/Cu Composites for Heat Sinks
Section titled āTechnical Documentation & Analysis: High-Performance Diamond/Cu Composites for Heat SinksāExecutive Summary
Section titled āExecutive SummaryāThis research validates the critical role of interface engineering in maximizing the thermal conductivity (TC) of diamond/copper (Cu) composites for high-power heat sink applications.
- Core Achievement: Achieved a high TC of 475.01 W mā»Ā¹ Kā»Ā¹ in 40 vol.% diamond/Cu composites by utilizing a nanosized Titanium (Ti) coating on the diamond particles.
- Interface Solution: The Ti coating acts as an effective ābridge,ā forming stable TiC and Cu-Ti intermetallic compounds during sintering, which drastically reduces interfacial thermal resistance.
- Failure Analysis: Nanosized Cu coatings failed due to the ānano effectāāsegregation and spheroidization at elevated sintering temperatures (1193 K to 1313 K)āresulting in low relative density and poor TC.
- Material Requirement: The success hinges on using high-quality synthetic diamond particles (Ib-type MBD-4) combined with precise, reactive metal coatings.
- Scalability: The fabrication method (powder metallurgy) is suitable for large-scale production, providing an immediate pathway for manufacturing high-performance thermal management substrates.
- 6CCVD Value Proposition: 6CCVD provides the necessary high-quality MPCVD diamond materials (PCD/SCD) and specialized Ti metalization services required to replicate and scale this high-TC composite technology.
Technical Specifications
Section titled āTechnical SpecificationsāThe following table summarizes the key performance metrics and material parameters achieved in the study, focusing on the optimal Ti-coated composite.
| Parameter | Value | Unit | Context |
|---|---|---|---|
| Peak Thermal Conductivity (TC) | 475.01 | W mā»Ā¹ Kā»Ā¹ | 40 vol.% Ti-coated diamond composite |
| Optimal Sintering Temperature | 1313 | K | For Ti-coated diamond/Cu composite |
| Optimal Diamond Volume Fraction | 40 | vol.% | For maximum TC (Ti-coated) |
| Relative Density (at Peak TC) | 98.5 | % | Ti-coated composite at 1313 K |
| Coefficient of Thermal Expansion (CTE) | 10.93 | 10ā»ā¶ Kā»Ā¹ | 40 vol.% Ti-coated composite at 1313 K |
| Raw Diamond TC (Reference) | 1450 | W mā»Ā¹ Kā»Ā¹ | Synthetic Ib-type MBD-4 (250 ppm N) |
| Raw Diamond Particle Size | 98-106 | µm | Used for composite reinforcement |
| Nanosized Coating Thickness | ~100 | nm | Initial Cu or Ti layer thickness |
| Uncoated Composite TC (Reference) | 262.82 | W mā»Ā¹ Kā»Ā¹ | 40 vol.% at 1243 K |
| Sintering Pressure (Hot Press) | 50 | MPa | Applied during 10-minute hold time |
Key Methodologies
Section titled āKey MethodologiesāThe diamond/Cu composites were fabricated using a conventional powder metallurgy route combined with advanced surface modification.
- Raw Material Selection: Synthetic Ib-type MBD-4 diamond particles (98-106 µm) were chosen for their high intrinsic TC (1450 W mā»Ā¹ Kā»Ā¹). Copper powder purity was 99.85 wt.%.
- Surface Modification: Nanosized Cu or Ti layers (approximately 100 nm thick) were deposited onto the diamond particle surfaces using a vacuum ion plating process.
- Mixing and Compaction: Diamond particles (30-60 vol.%) were mechanically mixed with copper powder for 2 hours, followed by cold pressing at 500 MPa for 5 minutes.
- Sintering Process: Samples were hot-pressed in a graphite mold at 50 MPa pressure. Sintering temperatures were varied between 1193 K and 1363 K to determine the optimal process window.
- Cooling: A controlled cooling rate of 10 K minā»Ā¹ was maintained using circulating cooling water.
- Interface Mechanism: The Ti coating successfully reacted with the diamond (forming TiC) and diffused with the copper matrix (forming Cu-Ti intermetallics), creating a strong, low-resistance thermal pathway.
6CCVD Solutions & Capabilities
Section titled ā6CCVD Solutions & Capabilitiesā6CCVD is uniquely positioned to supply the foundational materials and specialized services required to replicate and advance this high-performance thermal management research.
Applicable Materials
Section titled āApplicable MaterialsāThe research confirms that high-quality synthetic diamond is essential. 6CCVD offers materials tailored for thermal composite applications:
- Polycrystalline Diamond (PCD) Substrates: Ideal for large-area heat sink applications. 6CCVD provides PCD wafers up to 125 mm in diameter and thicknesses from 0.1 µm to 500 µm, offering excellent thermal spreading capabilities and customizable CTE matching.
- Single Crystal Diamond (SCD) Plates: For ultra-high-end applications requiring maximum intrinsic TC and purity. 6CCVD supplies SCD plates up to 500 µm thick, suitable for use as high-performance thermal inserts or reinforcement particles.
- Diamond Substrates: Available up to 10 mm thick for robust, high-load thermal applications.
Customization Potential
Section titled āCustomization PotentialāThe success of the Ti-coated composite relies on precise, high-quality metal deposition. 6CCVDās in-house capabilities directly address the critical requirements identified in this paper:
| Research Requirement | 6CCVD Capability | Technical Advantage |
|---|---|---|
| Reactive Interface Layer (Ti) | In-House Metalization: We offer deposition of Ti, Pt, Au, Pd, W, and Cu. | Ensures optimal chemical bonding (e.g., TiC formation) necessary to minimize interfacial thermal resistance. |
| Large-Scale Heat Sinks | Custom Dimensions: PCD plates up to 125 mm diameter. | Facilitates direct scale-up from lab-scale (38 mm) to commercial inch-size wafers for power electronics packaging. |
| High Density/Low Defect Rate | Advanced Polishing: Ra < 1 nm (SCD) and Ra < 5 nm (PCD). | Provides ultra-smooth surfaces for subsequent composite processing or direct chip bonding, further reducing thermal boundary resistance. |
| Custom Volume Fractions | Material Supply: SCD/PCD materials available in various forms and thicknesses (0.1 µm - 500 µm) for composite reinforcement. | Supports precise material loading (e.g., 40 vol.%) and optimization studies for specific TC/CTE targets. |
Engineering Support
Section titled āEngineering SupportāThe study highlights the complexity of interface design, particularly the failure mechanism of the Cu coating due to the ānano effect.ā
- Expert Consultation: 6CCVDās in-house PhD team specializes in MPCVD diamond properties and interface chemistry. We offer consultation services to assist engineers and scientists in selecting the optimal diamond material and metalization scheme (e.g., Ti vs. Cr vs. Mo) to prevent thermal degradation and achieve target TC/CTE values for high-power microelectronics heat sink projects.
- Global Logistics: We ensure reliable, global delivery of custom diamond materials (DDU default, DDP available), supporting international research and manufacturing supply chains.
For custom specifications or material consultation, visit 6ccvd.com or contact our engineering team directly.
View Original Abstract
The coefficients of thermal expansion (CTE) and thermal conductivity (TC) are important for heat sink applications, as they can minimize stress between heat sink substrates and chips and prevent failure from thermal accumulation in electronics. We investigated the interface behavior and manufacturing of diamond/Cu composites and found that they have much lower TCs than copper due to their low densities. Most defects, such as cavities, form around diamond particles, substantially decreasing the high TC of diamond reinforcements. However, the measurement results for the Cu-coated diamond/Cu composites are unsatisfactory because the nanosized copper layer on the diamond surface grew and spheroidized at elevated sintering temperatures. Realizing ideal interfacial bonding between a copper matrix and diamond particles is difficult. The TC of the 40 vol.% Ti-coated diamond/Cu composite is 475.01 W mā1 Kā1, much higher than that of diamond/Cu and Cu-coated diamond/Cu composites under equivalent manufacturing conditions. The minimally grown titanium layer retained its nanosized and was consistent with the sintering temperature. Depositing a nanosized titanium layer on a diamond surface will strengthen interfacial bonding through interface reactions among the copper matrix, nanosized titanium layer and diamond particles, reducing the interfacial thermal resistance and exploiting the high TC of diamond particles, even if defects from powder metallurgy remain. These results provide an important experimental and theoretical basis for manufacturing diamond/Cu composites for heat sink applications.
Tech Support
Section titled āTech SupportāOriginal Source
Section titled āOriginal SourceāReferences
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