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Influences of hydrogen ion irradiation on NcVsi − formation in 4H-silicon carbide

MetadataDetails
Publication Date2021-01-18
JournalApplied Physics Express
AuthorsTakuma Narahara, Shin Sato, Kazutoshi Kojima, Yasuto Hijikata, Takeshi Ohshima
InstitutionsNational Institute of Advanced Industrial Science and Technology, National Institutes for Quantum Science and Technology
Citations4

Abstract Nitrogen-vacancy (N C V Si − ) center in 4H-SiC is spin defect with near-infrared luminescence at room temperature and a promising candidate for quantum technologies. This paper reports on N C V Si − center formation in N-doped 4H-SiCs by hydrogen ion irradiation and subsequent thermal annealing. It is revealed photoluminescence for N C V Si − centers suddenly appears above the fluence of 5.0 × 10 15 cm −2 when annealed at 1000 °C. Appearance of a threshold fluence for their formation and/or activation has not been observed for other energetic particle irradiations. The possible mechanism is discussed based on the kinetics of hydrogen-related complexes and the majority carrier depletion caused by irradiation induced damage.