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Negative Differential Resistance of n-ZnO Nanorods/p-degenerated Diamond Heterojunction at High Temperatures

MetadataDetails
Publication Date2020-07-15
JournalFrontiers in Chemistry
AuthorsDandan Sang, Jiaoli Liu, Xiaofeng Wang, Dong Zhang, Feng Ke
InstitutionsStanford University, Liaocheng University
Citations18
AnalysisFull AI Review Included

Technical Analysis and Documentation: High-Temperature Diamond Heterojunctions

Section titled “Technical Analysis and Documentation: High-Temperature Diamond Heterojunctions”

This documentation analyzes the successful fabrication and characterization of an n-ZnO Nanorods/p-degenerated Diamond heterojunction, demonstrating robust Negative Differential Resistance (NDR) at elevated temperatures.

  • Core Achievement: Successful realization of a tunneling diode utilizing heavily Boron-Doped Diamond (BDD) that exhibits NDR phenomena up to 80 °C.
  • Material Performance: The p-degenerated diamond exhibited a high carrier concentration (1.7 x 1020 cm-3), confirming its suitability for high-power, high-temperature electronics.
  • Device Metrics: A Peak-to-Valley Current Ratio (PVCR) of 1.7 was achieved at 20 °C, decreasing slightly to 1.1 at 80 °C.
  • High-Temperature Operation: Operating at 80 °C resulted in a significant increase in forward current (up to 10 times higher than 20 °C) and a reduced turn-on voltage (from 1.5 V to 0.7 V).
  • Mechanism Validation: The study confirms that carrier transport is dominated by band-to-band tunneling and Fowler-Nordheim (FN) tunneling in the high-bias region.
  • Application Potential: These findings provide essential insight for designing and optimizing new-type NDR devices, resistive switching components, and resonant tunneling diodes for harsh, high-temperature environments.

The following table summarizes the key material properties and electrical performance metrics extracted from the research.

ParameterValueUnitContext
Diamond Material Typep-degeneratedN/AHeavily Boron-Doped Diamond (BDD)
BDD Carrier Concentration1.7 x 1020cm-3Essential for degenerated semiconductor structure
BDD Film Thickness4”mSynthesized by HFCVD
BDD Resistivity102Ω cmMeasured by Hall effect
ZnO Nanorod Diameter~80nmAverage dimension
ZnO Nanorod Length~2”mAverage dimension
Peak Current (Ip) (80 °C)20.4”AHigh-temperature performance
Valley Current (Iv) (80 °C)19.3”AHigh-temperature performance
PVCR (20 °C)1.7N/AMaximum observed ratio
PVCR (80 °C)1.1N/APerformance at elevated temperature
Turn-on Voltage (80 °C)0.7VMinimum observed voltage
Maximum Tested Temperature120°CNDR effect disappeared above 80 °C

The device fabrication relied on precise CVD techniques for diamond growth and subsequent thermal processing for nanorod synthesis.

  1. Substrate Preparation: Silicon wafers (1 cm x 1 cm) were mechanically abraded using diamond paste to enhance nucleation density, followed by ultrasonic cleaning.
  2. Diamond Synthesis (HFCVD): P-degenerated diamond film was grown using a 150 V bias-assisted Hot Filament Chemical Vapor Deposition (HFCVD) method.
  3. HFCVD Recipe Parameters:
    • Filament Heating: Spiral Tantalum wire heated to ~2,000 °C.
    • Substrate Temperature: ~700-800 °C.
    • Total Pressure: 40 Torr.
    • Gas Flow Rate (CH4/H2): 2.6 / 200 sccm.
    • Boron Source: Liquid B(OCH3)3 incorporated via 20 sccm H2 bubbling.
  4. ZnO Nanorod (NR) Fabrication: ZnO NRs were synthesized on the BDD film via thermal evaporation in a horizontal tube furnace.
  5. Thermal Evaporation Parameters:
    • Source Material: Mixed ZnO and Aluminum powders heated to 850 °C.
    • Substrate Temperature: ~500 °C (BDD substrate placed downstream).
    • Constant Pressure: 6 x 104 Pa.
  6. Device Contacting: A transparent conductive Indium-Tin-Oxide (ITO) glass was used as the negative electrode (on ZnO NRs), and a Silver (Ag) wire was used as the positive electrode (on BDD).

6CCVD is uniquely positioned to supply the high-quality, heavily doped diamond materials and custom fabrication services required to replicate, optimize, and scale this high-temperature NDR technology.

Research Requirement6CCVD Solution & CapabilityTechnical Advantage
Material: Heavily Boron-Doped Diamond (BDD)Heavy Boron-Doped Polycrystalline Diamond (PCD-BDD): We specialize in MPCVD BDD with precise, uniform doping control, achieving concentrations exceeding 1021 cm-3.Guarantees the highly conductive, degenerated semiconductor behavior (p-degenerated structure) essential for quantum tunneling and high-power device stability.
Dimensions & Scaling: 1 cm x 1 cm substratesCustom Dimensions up to 125 mm: We provide PCD plates and wafers up to 125 mm (5 inches) in diameter.Facilitates immediate scaling from R&D prototypes to commercial, large-area device fabrication for high-volume manufacturing.
Thickness Control: 4 ”m diamond filmPrecise Thickness Control: SCD and PCD layers available from 0.1 ”m up to 500 ”m, with substrates up to 10 mm thick.Allows for exact replication of the 4 ”m layer or optimization of junction thickness for specific electrical characteristics (e.g., capacitance, breakdown voltage).
Surface Quality: Smooth surface required for heterojunction growthUltra-Low Roughness Polishing: Polycrystalline diamond (PCD) polishing to Ra < 5 nm (inch-size). Single Crystal Diamond (SCD) polishing to Ra < 1 nm.Minimizes interfacial defects and roughness at the ZnO/Diamond interface, which is critical for maximizing carrier tunneling efficiency and PVCR.
Device Contacts: Ag and ITO electrodesCustom Metalization Services: Internal capability for depositing Au, Pt, Pd, Ti, W, and Cu layers.Provides flexibility for integrating robust ohmic contacts and complex electrode structures necessary for reliable operation in high-temperature and high-power environments.
Engineering Support: High-Temperature NDR/Tunneling ApplicationsIn-House PhD Engineering Team: Dedicated support for material selection, doping profile design, and surface preparation for wide-bandgap heterojunctions.Accelerates R&D cycles by ensuring optimal diamond material properties (thermal conductivity, stability, and doping) are met for harsh environment electronics.

For custom specifications or material consultation, visit 6ccvd.com or contact our engineering team directly.

View Original Abstract

In the present study, an n-ZnO nanorods (NRs)/p-degenerated diamond tunneling diode was investigated with regards to its temperature-dependent negative differential resistance (NDR) properties and carrier tunneling injection behaviors. The fabricated heterojunction demonstrated NDR phenomena at 20 and 80°C. However, these effects disappeared followed by the occurrence of rectification characteristics at 120°C. At higher temperatures, the forward current was increased, and the turn-on voltage and peak-to-valley current ratio (PVCR) were reduced. In addition, the underlying mechanisms of carrier tunneling conduction at different temperature and bias voltages were analyzed through schematic energy band diagrams and semiconductor theoretical models. High-temperature NDR properties of the n-ZnO NRs/p-degenerated diamond heterojunction can extend the applications of resistive switching and resonant tunneling diodes, especially in high-temperature, and high-power environments.

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