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Hard X-ray wavefront correction via refractive phase plates made by additive and subtractive fabrication techniques

MetadataDetails
Publication Date2020-07-30
JournalJournal of Synchrotron Radiation
AuthorsFrank Seiboth, Dennis BrĂŒckner, Maik Kahnt, Mikhail Lyubomirskiy, Felix Wittwer
InstitutionsDeutsches Elektronen-Synchrotron DESY, Friedrich Schiller University Jena
Citations24
AnalysisFull AI Review Included

Technical Documentation & Analysis: Hard X-ray Wavefront Correction using MPCVD Diamond Phase Plates

Section titled “Technical Documentation & Analysis: Hard X-ray Wavefront Correction using MPCVD Diamond Phase Plates”

Reference: Seiboth et al. (2020). Hard X-ray wavefront correction via refractive phase plates made by additive and subtractive fabrication techniques. J. Synchrotron Rad. 27, 1121-1130.


This research validates the use of diamond phase plates for high-performance X-ray optics, directly aligning with 6CCVD’s core material expertise.

  • Aberration Correction Success: Spherical aberration in Beryllium Compound Refractive Lenses (CRLs) was successfully corrected using refractive phase plates fabricated from single-crystal CVD diamond and polymer.
  • Performance Improvement: The diamond phase plate improved the Strehl ratio of a lens stack at 8.2 keV from 0.10 to 0.70, demonstrating a seven-fold increase in central speckle intensity.
  • Material Superiority for XFELs: Single-crystal diamond (SCD) is confirmed as the material of choice for high-intensity applications due to its high thermal conductivity and low X-ray absorption.
  • High-Energy Capability: Correction was successfully demonstrated at high X-ray energy (35 keV), achieving a diffraction-limited Strehl ratio of 0.89 using a polymer plate.
  • Fabrication Challenge Identified: Femtosecond laser ablation of diamond resulted in a high surface roughness (Sa = 0.32 ”m), which limits ultimate performance and necessitates post-processing (polishing).
  • 6CCVD Value Proposition: 6CCVD’s ultra-low roughness SCD material (Ra < 1 nm) directly addresses the primary limitation (surface roughness) encountered in the diamond fabrication process described.

The following hard data points were extracted from the experimental results comparing aberrated and corrected lens systems.

ParameterValueUnitContext
Low X-ray Energy8.2keVDLS I13-1 Beamline
High X-ray Energy35.0keVPETRA III P06 Beamline
Diamond Substrate Thickness300”mCVD Single-Crystal Diamond
Diamond Phase Plate Roughness (Sa)0.32”mPost-ablation measurement
Strehl Ratio (Aberrated, 8.2 keV)0.10N/A50 Be CRLs, without phase plate
Strehl Ratio (Corrected, 8.2 keV)0.70N/ADiamond phase plate correction
Corrected Focal Spot Size (8.2 keV)76nmFWHM
Strehl Ratio (Aberrated, 35 keV)0.15N/A149 Be CRLs, without phase plate
Strehl Ratio (Corrected, 35 keV)0.89N/APolymer phase plate correction
Corrected Focal Spot Size (35 keV)95nmFWHM (Coherent spot size)
Diamond Transmission (System Total)12.4%Total optical system transmission
Polymer Transmission (System Total)35%Total optical system transmission
Diamond PV Wavefront Error Reduction3.5 λ to 0.75 λN/APeak-to-Valley error

The experiment utilized complementary fabrication techniques and advanced X-ray imaging methods to characterize and correct wavefront errors.

  1. Material Selection: Single-crystal CVD diamond (2.6 mm x 2.6 mm x 0.3 mm, (100) orientation) was selected for its superior radiation resistance and thermal properties, essential for high-intensity X-ray sources.
  2. Diamond Fabrication (Subtractive): Phase plates were manufactured using femtosecond laser ablation.
    • The diamond substrate was initially thinned by 76 ”m (12 kHz repetition rate, 160 nJ pulse energy).
    • The phase plate structure was subsequently ablated in 70 layers (6 kHz repetition rate, 50 nJ pulse energy).
  3. Polymer Fabrication (Additive): Phase plates for 35 keV correction were manufactured using two-photon polymerization (TPP) in a Nanoscribe IP-S resist.
  4. Wavefront Characterization: Ptychography, a scanning coherent diffraction imaging method, was used to retrieve the complex wavefield and quantitatively determine the performance of the Be CRLs.
  5. Phase Plate Design: The thickness profile $z_{pp}(x, y)$ was calculated based on the residual wavefront error ($\Psi_{\epsilon}$) derived from the ptychographic reconstruction, designed to introduce a compensating phase shift ($\phi_{pp}$).
  6. Surface Metrology: Laser-scanning microscopy (LSM) was used to measure the surface profile and determine the roughness of the fabricated phase plates.

6CCVD provides the high-specification MPCVD diamond materials and precision processing required to replicate and extend this research, particularly addressing the surface roughness limitations inherent in the laser ablation method used in the paper.

Requirement from Paper6CCVD SolutionTechnical SpecificationValue Proposition
High Radiation ResistanceOptical Grade SCDSCD (100) orientation, low nitrogen contentIdeal thermal management and low absorption for XFEL and high-flux synchrotron applications.
Low Surface RoughnessPrecision Polished SCDRa < 1 nm (Standard)Directly mitigates the Sa = 0.32 ”m roughness reported from laser ablation, minimizing incoherent scattering and improving shape fidelity.
High-Energy TransparencyOptical Grade SCDThicknesses from 0.1 ”m up to 500 ”mOptimized transmission for hard X-ray energies (8.2 keV to 35 keV and beyond).

6CCVD’s manufacturing capabilities are perfectly suited to meet the demanding specifications of next-generation X-ray optics, including custom phase plates and CRL components.

  • Custom Dimensions: While the paper used small 2.6 mm x 2.6 mm plates, 6CCVD offers SCD plates up to 500 ”m thick and large-area PCD wafers up to 125 mm in diameter, enabling the production of larger aperture optics necessary for collecting high lateral coherence beams.
  • Precision Thickness Control: 6CCVD offers SCD and PCD materials with thickness control down to 0.1 ”m, crucial for achieving the precise phase shifts required for aberration correction across a broad energy range.
  • Metalization Services: For integration into complex optical setups, 6CCVD provides in-house metalization capabilities (Au, Pt, Pd, Ti, W, Cu). This allows researchers to specify precise metal layers for mounting, alignment, or electrical contacting of the diamond phase plates.
  • Substrate Preparation: 6CCVD can supply custom diamond substrates up to 10 mm thick, providing robust platforms for subsequent microfabrication techniques (like the laser ablation or ion beam etching mentioned in the paper).

6CCVD’s in-house PhD team specializes in the application of MPCVD diamond for demanding scientific instruments. We offer expert consultation on:

  • Material Selection: Optimizing diamond grade (SCD vs. PCD, doping levels) based on specific X-ray energy, flux, and thermal load requirements.
  • Surface Finish Optimization: Assisting researchers in specifying the optimal polishing grade to ensure diffraction-limited performance (Ra < 1 nm) for X-ray wavefront correction projects.
  • Integration Support: Providing technical guidance on mounting and integrating custom diamond optics into ptychography and nanofocusing beamline setups.

For custom specifications or material consultation, visit 6ccvd.com or contact our engineering team directly.

View Original Abstract

Modern subtractive and additive manufacturing techniques present new avenues for X-ray optics with complex shapes and patterns. Refractive phase plates acting as glasses for X-ray optics have been fabricated, and spherical aberration in refractive X-ray lenses made from beryllium has been successfully corrected. A diamond phase plate made by femtosecond laser ablation was found to improve the Strehl ratio of a lens stack with a numerical aperture (NA) of 0.88 × 10 −3 at 8.2 keV from 0.1 to 0.7. A polymer phase plate made by additive printing achieved an increase in the Strehl ratio of a lens stack at 35 keV with NA of 0.18 × 10 −3 from 0.15 to 0.89, demonstrating diffraction-limited nanofocusing at high X-ray energies.