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Development of an Array of Compound Refractive Lenses for Sub-Pixel Resolution, Large Field of View, and Time-Saving in Scanning Hard X-ray Microscopy

MetadataDetails
Publication Date2020-06-16
JournalApplied Sciences
AuthorsTalgat Mamyrbayev, Alexander Opolka, Alexey Ershov, Josephine Gutekunst, Pascal Meyer
InstitutionsKarlsruhe Institute of Technology, Tohoku University
Citations5
AnalysisFull AI Review Included

Technical Documentation & Analysis: Hard X-ray Compound Refractive Lens Arrays

Section titled “Technical Documentation & Analysis: Hard X-ray Compound Refractive Lens Arrays”

This research demonstrates the successful fabrication and characterization of a high-performance 2D array of Compound Refractive Lenses (CRLs) for hard X-ray microscopy. The findings validate a methodology for achieving sub-pixel resolution and a large field of view (FoV) in scanning transmission X-ray microscopy (STXM).

  • Application: Sub-pixel resolution scanning transmission hard X-ray microscopy (STXM) for optically thick samples.
  • Core Achievement: Development of a 34 x 34 multi-lens array generating 1156 point foci, enabling a large 3.5 mm2 FoV.
  • Resolution: Achieved sub-pixel resolution with small average focal spot sizes (2.10 ”m x 3.55 ”m FWHM) at 34 keV.
  • Fabrication Method: Deep X-ray Lithography (LIGA process) utilizing radiation-stable SU-8 polymer resist, achieving sidewall roughness of approximately 20 nm.
  • Performance Metric: Demonstrated an average Spectral Intensity Enhancement (SIE) of 16 and 66% transmission, significantly reducing scanning time compared to conventional single-lens STXM.
  • Future Direction: The study explicitly discusses the need for higher energy optics (>80 keV) using materials like Nickel, requiring superior material stability and precision.
  • 6CCVD Value Proposition: 6CCVD offers ultra-low roughness Single Crystal Diamond (SCD) substrates (Ra < 1 nm), providing superior thermal and radiation stability necessary to extend this high-precision optics research to higher photon energies and higher flux environments.

The following hard data points were extracted from the characterization of the 2D multi-lens array at the Diamond Light Source (B16 beamline).

ParameterValueUnitContext
Operating Energy34keVMonochromatic X-ray illumination
Energy Resolution10-4$\Delta E/E$Si (311) channel-cut monochromator
Array Configuration34 x 34Lenses2D multi-lens array (1156 foci)
Field of View (FoV)3.5mm2Total imaging area
Design Focal Length ($f_{v,h}$)359mmCalculated optimal focal distance
Measured Focal Length ($f_{exp,v,h}$)362 $\pm$ 4mmExperimental result
Vertical Focal Spot Size (FWHM)2.10 $\pm$ 0.81”mAverage measured FWHM
Horizontal Focal Spot Size (FWHM)3.55 $\pm$ 0.62”mAverage measured FWHM
Physical Aperture ($A_{ph}$)55 x 55”mMatches detector pixel pitch
Average Transmission ($T_{avg}$)66%Measured via SIE for 55 ”m x 55 ”m reference area
Average SIE (Gain)16-Spectral Intensity Enhancement (1.8 ”m x 1.8 ”m reference area)
Resist Sidewall Roughness~20nmAchieved via Deep X-ray Lithography
Total Scan Time (Estimated)~50minFor a complete 3.5 megapixel raster scan

The 2D CRL array was fabricated using high-precision lithography and mechanical assembly, and characterized using synchrotron radiation.

  1. Material Selection: SU-8 epoxy-based negative resist (radiation stable up to 2 MJ/cm3) was used on a 525 ”m silicon substrate.
  2. Mask Preparation: An X-ray absorber working mask was created using 20 ”m gold absorbers on a 2.5 ”m titanium membrane.
  3. Deep X-ray Lithography (LIGA): The SU-8 resist was exposed to X-rays (dose: 19,845 mA*min/cm3) to create 1D line focus lenses with parallel, smooth sidewalls (roughness ~20 nm).
  4. Post-Processing: Post-exposure bake (66 °C for 20 h), followed by development (PGMEA for 2 h) and rinsing (isopropanol).
  5. 2D Assembly: To achieve a point focus, the 1D line focus lenses were cut by a diamond wafer saw, rotated 90° around the optical axis, and mounted in an interdigitated configuration.
  6. X-ray Characterization: The array was tested at the Diamond Light Source (B16) using 34 keV X-rays generated by a Si (311) channel-cut monochromator.
  7. Detection: Point foci were measured using a high-resolution indirect detector system (LuAG:Eu scintillator, 10x objective, CCD camera) resulting in an effective pixel size of 0.9 ”m x 0.9 ”m.
  8. Data Analysis: Focal distance and spot size (FWHM) were determined by scanning the detector along the optical axis and fitting the foci using the 2D Gaussian method.

The research highlights the critical need for materials with extreme stability, low roughness, and high transparency for hard X-ray optics, especially when scaling to higher energies (>80 keV) or higher flux. 6CCVD’s MPCVD diamond materials are ideally suited to meet and exceed these requirements, offering a path to next-generation X-ray optics.

While the current study used polymer (SU-8) and discussed Nickel (Ni), Optical Grade Single Crystal Diamond (SCD) from 6CCVD offers superior performance for hard X-ray applications:

Material Requirement6CCVD SolutionAdvantage over Polymer/Ni
Radiation StabilityOptical Grade SCDDiamond is the most radiation-hard material, eliminating degradation seen in polymers (SU-8) under high flux.
Thermal ManagementOptical Grade SCDHighest known thermal conductivity, crucial for managing heat load from high-flux synchrotron beams.
Surface PrecisionOptical Grade SCDGuaranteed polishing to Ra < 1 nm (up to 20x smoother than the 20 nm achieved in SU-8), minimizing scattering and improving focus quality.
High Energy TransparencyOptical Grade SCDExcellent transparency at hard X-ray energies (34 keV and above 80 keV), reducing absorption losses compared to polymers or metals like Ni.
Substrate/WindowPolycrystalline Diamond (PCD)Available in large plates (up to 125 mm diameter) and custom thicknesses (0.1 ”m to 500 ”m) for use as high-stability optical windows or substrates.

6CCVD’s manufacturing capabilities directly address the precision and dimensional requirements necessary for replicating or advancing this CRL array research.

  • Dimensional Control: The paper used a small array (1.87 mm x 1.87 mm). 6CCVD can supply large-area PCD substrates up to 125 mm for scaling up the FoV of future arrays.
  • Ultra-Precision Polishing: The achieved focal spot size is highly dependent on surface quality. 6CCVD provides SCD polishing to Ra < 1 nm and Inch-size PCD polishing to Ra < 5 nm, ensuring minimal wavefront distortion and superior focusing performance compared to the 20 nm roughness reported.
  • Metalization Services: The paper discussed the potential for Ni CRLs fabricated via electroplating (LIGA). 6CCVD offers in-house metalization capabilities (including Au, Pt, Ti, W, and Cu) for creating high-precision contacts or masks on diamond substrates, supporting advanced LIGA or etching processes.
  • Custom Thickness: We provide SCD and PCD plates in thicknesses ranging from 0.1 ”m to 500 ”m, allowing researchers to optimize the substrate thickness for specific X-ray energy absorption and mechanical stability requirements.

6CCVD’s in-house PhD team specializes in the material science of diamond for extreme environments. We can assist researchers in material selection and specification for similar Hard X-ray Microscopy and High-Flux Optics projects, ensuring the chosen diamond material maximizes performance, stability, and longevity.

For custom specifications or material consultation, visit 6ccvd.com or contact our engineering team directly.

View Original Abstract

A two-dimensional array of compound refractive lenses (2D array of CRLs) designed for hard X-ray imaging with a 3.5 mm2 large field of view is presented. The array of CRLs consists of 2D polymer biconcave parabolic 34 × 34 multi-lenses fabricated via deep X-ray lithography. The developed refractive multi-lens array was applied for sub-pixel resolution scanning transmission X-ray microscopy; a raster scan with only 55 × 55 steps provides a 3.5 megapixel image. The optical element was experimentally characterized at the Diamond Light Source at 34 keV. An array of point foci with a 55 ”m period and an average size of ca. 2.1 ”m × 3.6 ”m was achieved. In comparison with the conventional scanning transmission microscopy using one CRL, sub-pixel resolution scanning transmission hard X-ray microscopy enables a large field of view and short scanning time while keeping the high spatial resolution.

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