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Production and Heat Properties of an X-ray Reflective Anode Based on a Diamond Heat Buffer Layer

MetadataDetails
Publication Date2020-01-06
JournalMaterials
AuthorsXinwei Li, Xin Wang, Ye Li, Yanyang Liu
InstitutionsChangchun University of Science and Technology
Citations6
AnalysisFull AI Review Included

Technical Documentation & Analysis: Diamond Heat Buffer Layers for High-Power X-ray Anodes

Section titled “Technical Documentation & Analysis: Diamond Heat Buffer Layers for High-Power X-ray Anodes”

This research validates the use of MPCVD diamond as a critical heat buffer layer to significantly enhance the thermal stability and power limits of reflective micro-focus X-ray anodes.

  • Core Value Proposition: Diamond’s exceptional thermal conductivity (TC) enables rapid vertical and horizontal heat dissipation, preventing localized thermal destruction at the electron beam focal spot.
  • Material Performance: The fabricated diamond composite anode achieved a measured thermal conductivity of 1893 W/m K for the buffer layer.
  • Power Limit Doubled: The diamond composite anode demonstrated a working power limit of 73 W, nearly twice the limit of conventional tungsten anodes (37.9 W).
  • Thermal Stability: The diamond buffer layer reduced the focal spot surface temperature by up to 463 °C compared to a conventional copper-backed anode under identical operating conditions.
  • Interface Engineering: Robust inter-layer bonding was achieved using a vacuum-evaporation coating process to deposit Titanium (Ti), forming a stable TiC (carbonized alloy) layer for strong adhesion between the diamond and the copper substratum via high-temperature vacuum brazing.
  • Application: This technology is a breakthrough for high-resolution X-ray imaging systems requiring high intensity and minimized focal spot size (e.g., 20 ”m).

The following hard data points were extracted from the research paper, detailing the material properties and performance metrics of the diamond composite anode.

ParameterValueUnitContext
Diamond Thermal Conductivity (TC)1893W/m KMeasured via Photo-Thermal Deflection (PTD) method.
Diamond Layer Thickness500 (0.5)”m (mm)Optimized thickness for heat buffering.
Tungsten Film Thickness2.2”mX-ray target layer deposited via magnetron sputtering.
Solder Layer Thickness15”mUsed for bonding diamond to copper substratum.
Diamond Raman Peak1330cm-1Characteristic absorption peak confirming diamond structure.
Thermal Stress Coefficient1.2 x 10-6/°CParameter used in thermal modeling.
Reference Focal Spot Size20”mStandard spot size for micro-focus X-ray inspections.
Diamond Anode Power Limit73WDetermined by the melting point of the Tungsten target (3400 °C).
Conventional Anode Power Limit37.9WPower limit of conventional tungsten anode (Type b).
Surface Temperature Reduction463°CTemperature difference vs. conventional anode at 300 s.
Heat Flux Relationshipq = λ(T1 - T2)/ΎN/AHeat flux (q) increases directly with thermal conductivity (λ) for similar temperature differences (T1-T2) and thickness (Ύ).

The production of the diamond composite anode required precise MPCVD growth and advanced interface engineering techniques:

  1. Diamond Layer Preparation: A diamond heat buffer layer was prepared on a Molybdenum (Mo) slice using the Plasma Enhanced Chemical Vapor Deposition (PECVD) method, achieving a thickness of 0.5 mm (500 ”m).
  2. Layer Separation: The diamond layer was separated from the Mo slice post-deposition.
  3. Surface Metallization (Adhesion Layer): Titanium (Ti) was deposited onto the diamond surface using a vacuum-evaporation coating process. High-temperature annealing followed, causing Ti to react with the diamond to form a stable TiC (carbonized alloy) structure, ensuring robust Ohmic contact and high adhesion.
  4. Brazing: The metallized diamond layer was soldered tightly to a Copper Substratum using a special 15 ”m thick solder alloy under high vacuum and high temperature. A gradient temperature profile was used during heating and cooling to mitigate stress caused by differing thermal expansion coefficients.
  5. Target Layer Deposition: A 2.2 ”m thick Tungsten (W) film (the X-ray target) was deposited onto the opposite diamond surface using magnetron sputtering.
  6. Thermal Analysis: Performance was verified using Finite Element Analysis (FEA) modeling (ANSYS software) validated by experimental measurements, including Photo-Thermal Deflection (PTD) for thermal diffusion and infrared imaging spectrographs (900-2500 nm range) for indirect surface temperature calculation at the focal spot.

6CCVD specializes in providing the high-quality, custom MPCVD diamond materials and precision fabrication services necessary to replicate and advance this critical X-ray anode technology.

To replicate or extend this research, the primary material required is high-purity, high-thermal conductivity Polycrystalline Diamond (PCD).

  • Recommended Material: Optical Grade PCD (Polycrystalline Diamond).
  • Justification: The paper explicitly notes the diamond layer was prepared via PECVD and possesses a polycrystalline structure with a TC of 1893 W/m K. 6CCVD’s MPCVD-grown PCD routinely achieves and exceeds this thermal performance, ensuring maximum heat diffusion and thermal stability required for high-power applications.

The successful fabrication of the composite anode relies on precise dimensional control and advanced interface engineering, both core competencies of 6CCVD.

Requirement from Paper6CCVD CapabilityBenefit to Customer
Thickness (0.5 mm / 500 ”m)PCD plates available from 0.1 ”m up to 500 ”m, and substrates up to 10 mm.Exact thickness matching for optimal thermal modeling and performance.
Metallization (Ti/TiC Adhesion Layer)In-house deposition of Ti, Pt, Au, Pd, W, Cu.We provide custom Ti deposition and controlled annealing processes to form the critical TiC adhesion layer required for robust diamond-to-metal brazing.
Polishing (Surface Quality)PCD polishing to Ra < 5 nm (inch-size wafers).Ensures smooth, high-quality interfaces for uniform target layer deposition (Tungsten) and reliable thermal contact.
Dimensions (Custom Anode Size)Plates/wafers up to 125 mm (PCD).Ability to scale up successful micro-focus designs to larger, high-power X-ray systems.
ShippingGlobal shipping (DDU default, DDP available).Reliable, worldwide delivery of sensitive materials.

The successful integration of diamond into X-ray anodes relies heavily on precise material selection, thermal modeling, and interface engineering (brazing, metallization). 6CCVD’s in-house PhD team can assist with material selection, thermal modeling, and interface optimization for similar High-Power Micro-Focus X-ray Anode projects, ensuring optimal thermal stability and power limits.

For custom specifications or material consultation, visit 6ccvd.com or contact our engineering team directly.

View Original Abstract

This paper introduces an X-ray reflective anode with a diamond heat buffer layer, so as to improve heat dissipation of micro-focus X-ray sources. This also aids in avoiding the destruction of the anode target surface caused by the accumulation of heat generated by the electron beam bombardment in the focal spot area. In addition to the description of the production process of the new reflective anode, this study focuses more on the research of the thermal conductivity and compounding ability. This paper also introduces a method that combines finite element analysis (FEA) in conjunction with thermal conductivity experiments, and subsequently demonstrates the credibility of this method. It was found that due to diamonds having a high thermal conductivity and melting point, high heat flux produced in the micro-focus spot region of the anode could be conducted and removed rapidly, which ensured the thermal stability of the anode. Experiments with the power parameters of the radiation source were also completed and showed an improvement in the power limit twice that of the original.

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