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Phase diagram of boron-doped diamond revisited by thickness-dependent transport studies

MetadataDetails
Publication Date2017-04-10
JournalPhysical review. B./Physical review. B
AuthorsJ Bousquet, T. Klein, M. P. Barreda Solana, Laurent Saminadayar, C. Marcenat
InstitutionsCentre National de la Recherche Scientifique, Université Grenoble Alpes
Citations17
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6CCVD Technical Documentation: Advanced Boron-Doped Diamond (BDD) for Quantum Transport Studies

Section titled “6CCVD Technical Documentation: Advanced Boron-Doped Diamond (BDD) for Quantum Transport Studies”

This documentation analyzes the key findings from “Phase diagram of boron-doped diamond revisited by thickness-dependent magneto-transport studies,” focusing on how the results validate and require 6CCVD’s ultra-precise MPCVD and fabrication capabilities, particularly for the creation of quantum materials.

  • Novel Phase Diagram Unveiled: By employing well-defined mesa patterns to eliminate parasitic currents due to doping inhomogeneities, researchers successfully unveiled a new phase diagram separating the onset of superconductivity (SC) from the Metal-Insulator Transition (MIT).
  • Separation of Key Transitions: The MIT threshold ($n_{B}$MIT) was confirmed near 3 ± 1 x 1020 cm-3, while the onset of superconductivity ($n_{c}$σ) was found significantly higher at 11 ± 2 x 1020 cm-3, confirming a non-superconducting metallic phase in between.
  • Robust 2D Superconductivity: A dimensional crossover from 3D to 2D transport was successfully induced by reducing the epilayer thickness ($d_{l}$) down to 8 nm. Crucially, the critical temperature ($T_{c}$) was not reduced, demonstrating the robustness of superconductivity in the 2D regime.
  • Dimensional Control: The study confirms that thickness control (ranging from 2 ”m down to 8 nm) is a critical parameter for exploring transport physics, enabling researchers to probe 3D and 2D interaction regimes.
  • Advanced Fabrication Required: The work relied heavily on highly controlled MPCVD BDD growth on [100]-oriented NID substrates, followed by precise mesa patterning (O2 plasma etch) and multi-layer Ti/Pt/Au metalization.
ParameterValueUnitContext
Boron Concentration Range ($n_{B}$)1 x 1020 to 3 x 1021cm-3Range studied for phase diagram mapping.
Epilayer Thickness ($d_{l}$) Range8 nm to 2”mUsed to induce dimensional crossover.
MIT Concentration ($n_{B}$MIT)3 ± 1 x 1020cm-3Threshold separating insulating and metallic states.
SC Onset Concentration ($n_{c}$σ)11 ± 2 x 1020cm-3Minimum concentration for observing superconductivity.
Maximum Critical Temperature ($T_{c}$) Observed2 to 3KAchieved for $n_{B}$ near $2n_{c}$σ.
Low $T$ Conductivity Dependence (3D)$\sigma(T) = \sigma_{0} + A \sqrt{T}$N/AObserved in thick samples (e.g., $d_{l}=85$ nm).
Low $T$ Conductivity Dependence (2D)$\sigma(T) \approx \sigma_{0} + B \cdot \ln(T)$N/AObserved in thin samples (e.g., $d_{l}=8$ nm).
Thermal Coherence Length ($L_{T}$) at 5 K$\approx 20$nmConsistent with dimensional crossover reached at $T_{cr} \approx 5$ K for $d_{l}=8$ nm.

The complex transport behavior was isolated and measured by employing stringent growth controls and advanced nanoscale fabrication techniques:

  1. Substrate Preparation: MPCVD growth was performed on [100]-oriented NID (Non-Intentionally Doped) diamond layers (hundreds of nm thick), deposited on IIa or Ib-type diamond substrates.
  2. Growth Parameters (Doping Control):
    • Temperature Stability: NID layer growth at ~910°C; B-doped layer growth at ~830°C.
    • Pressure: 33 or 50 torr (stabilized for growth).
    • Gas Composition: Methane (CH4/H2=1% molar ratio) used for buffer. Oxygen (CH4/O2/H2: 0.75%, 0.25%) added to control boron incorporation and surface roughness.
    • Growth Rate Variation: Rates were precisely controlled, ranging from ~5 nm/min (Position 2) to ~32 nm/min (Position 1), allowing for accurate nm-scale thickness control (8 nm to 2 ”m).
  3. Mesa Patterning (Critical Step): Well-defined mesa patterns (Hall-bars, 3x3 mmÂČ size) were delineated on the epilayers using O2 plasma treatment. This step was essential to suppress parasitic current paths induced by doping inhomogeneities at the sample edges.
  4. Electrical Contact Preparation: Four-contact measurements utilized metallic pads composed of Ti/Pt/Au deposited on the delineated mesa structures.
  5. Measurement: Transport measurements were conducted from 300 K down to 50 mK using dilution fridge and PPMS systems.

6CCVD is uniquely positioned to supply the highly demanding materials and processing required to replicate and extend this foundational research into boron-doped diamond quantum physics.

To achieve the precise doping, thickness, and crystallographic requirements of this study, researchers need specialized Boron-Doped Single Crystal Diamond (BDD) materials.

6CCVD Material SolutionSpecification MatchApplication Relevance
Heavy Boron-Doped SCD (BDD)Achieves critical doping range (1020 to 3 x 1021 cm-3) required to span the Insulator, Metallic Non-SC, and Superconducting phases.Replicating the full BDD phase diagram.
[100]-Oriented SCD SubstratesMatches the crystallographic orientation used in the study for reliable, high-quality epitaxial growth.Minimizing strain and optimizing electronic topology.
Epitaxial NID Buffer LayersRequired to match the study’s method of minimizing defects originating from the substrate surface prior to BDD growth.Ensuring intrinsic film properties are measured, especially for thin films.
Ultra-Thin Film ControlSCD Thickness control available from 0.1 ”m down to 8 nm (and below, upon consultation), essential for studying 2D quantum transport.Enabling precise dimensional crossover studies ($d_{l}$ control).

The success of the research was contingent upon specialized fabrication steps that are standard offerings within 6CCVD’s in-house engineering portfolio:

  • Precision Substrate Preparation: We provide standard NID (IIa) or semi-insulating (Ib) substrates with ultra-low surface roughness (Ra < 1 nm) to ensure high-quality epitaxial layer growth, minimizing interface scattering.
  • Custom Metalization Stacks: The study utilized a specific Ti/Pt/Au stack for robust ohmic contacts. 6CCVD offers in-house deposition capabilities for Ti, Pt, Au, Pd, W, and Cu, allowing clients to customize contact metal compositions and thicknesses (e.g., optimizing for superconducting contacts or high-temperature stability).
  • Micromachining and Patterning: While the researchers used O2 plasma etching for mesa delineation, 6CCVD provides precision laser cutting and deep reactive ion etching (DRIE) services to define complex geometries, such as Hall bars or quantum device architectures (up to 125mm).

6CCVD’s in-house PhD material science team understands the interplay between disorder ($k_{F}l$), dimensionality, and superconductivity identified in this paper. We assist engineers and researchers working on applications that require:

  • Advanced Superconducting Devices: Tailoring BDD thickness and doping to achieve robust 2D superconductivity for microwave kinetic inductance detectors (MKIDs) or superconducting quantum circuits.
  • High-Frequency Electronics: Designing BDD materials optimized for the non-superconducting metallic phase, where high carrier concentration and low disorder are crucial.
  • Quantum Sensing: Providing materials for experiments leveraging the electron-phonon coupling mechanism identified in BDD.

For custom specifications or material consultation, visit 6ccvd.com or contact our engineering team directly.